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1

Ultralow surface recombination in p-Si passivated by catalytic-chemical vapor deposited alumina films

Yoh-Ichiro Ogita, Masayuki Tachihara, Yotaro Aizawa, Naoyuki Saito

Journal:

Thin Solid Films

Year:

2011

Language:

english

File:

PDF, 528 KB

english, 2011

2

Low surface recombination velocity in n-Si passivated by catalytic-chemical vapor deposited alumina films

Ogita, Yoh-Ichiro, Aizawa, Yotaro

Journal:

Thin Solid Films

Year:

2015

Language:

english

File:

PDF, 651 KB

english, 2015

3

Formation of alumina film using alloy catalyzers in catalytic chemical vapor deposition

Ogita, Yoh-Ichiro, Saito, Naoyuki

Journal:

Thin Solid Films

Year:

2015

Language:

english

File:

PDF, 1.25 MB

english, 2015

4

Reduction of surface recombination velocity by rapid thermal annealing of p-Si passivated by catalytic-chemical vapor deposited alumina films

Ogita, Yoh-Ichiro, Tachihara, Masayuki

Journal:

Thin Solid Films

Year:

2015

Language:

english

File:

PDF, 581 KB

english, 2015

5

Electrical properties of alumina films grown on Si at low temperature using catalytic CVD

Yoh-Ichiro Ogita, Satoshi Ohsone, Tsugutomo Kudoh, Fumitaka Sakamoto

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 313 KB

english, 2008

6

Composition of alumina films grown on Si at low temperature with catalytic CVD

Yoh-Ichiro Ogita, Tugutomo Kudoh, Fumitaka Sakamoto

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 378 KB

english, 2008

7

Low temperature decomposition of large molecules of TMA using catalyzers with resistance to oxidation in catalytic CVD

Yoh-Ichiro Ogita, Tugutomo Kudoh, Ryohei Iwai

Journal:

Thin Solid Films

Year:

2009

Language:

english

File:

PDF, 521 KB

english, 2009

8

Resistance characteristics to oxidation of the metal-catalyzer for Cat-CVD

Tsugutomo Kudoh, Yoh-Ichiro Ogita

Journal:

Thin Solid Films

Year:

2009

Language:

english

File:

PDF, 451 KB

english, 2009

9

Al2O3 formation on Si by catalytic chemical vapor deposition

Yoh-Ichiro Ogita, Shinshi Iehara, Toshiyuki Tomita

Journal:

Thin Solid Films

Year:

2003

Language:

english

File:

PDF, 123 KB

english, 2003

10

The mechanism of alumina formation from TMA and molecular oxygen using Catalytic-CVD with a tungsten catalyzer

Yoh-Ichiro Ogita, Toshiyuki Tomita

Journal:

Thin Solid Films

Year:

2006

Language:

english

File:

PDF, 175 KB

english, 2006

11

The mechanism of alumina formation from TMA and molecular oxygen using catalytic-CVD with an iridium catalyzer

Yoh-Ichiro Ogita, Toshiyuki Tomita

Journal:

Thin Solid Films

Year:

2006

Language:

english

File:

PDF, 127 KB

english, 2006

12

Contactless Measurement of Carrier Lifetime in Semiconductor Wafers by Use of Strip Lines

Ogita, Yoh-ichiro

Journal:

Japanese Journal of Applied Physics

Year:

1980

File:

PDF, 272 KB

1980

13

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II - Silicon wafer subsurface characterization with blue-laser/microwave and UV-laser/millimeter-wave photoconductivity techniques

Ogita, Yoh-Ichiro, Shinohara, Hiroshi, Sawanobori, Tsuyoshi, Kurokawa, Masaki, Ajuria, Sergio A., Hossain, Tim Z.

Year:

1998

Language:

english

File:

PDF, 542 KB

english, 1998

14

Contactless Measurement of Short Carrier Lifetime in Heat-Treated N-Type Silicon

Yamazaki, Tatsuya, Ogita, Yoh-ichiro, Ikegami, Yoshikazu, Onaka, Hiroshi, Ohta, Eiji, Sakata, Makoto

Journal:

Japanese Journal of Applied Physics

Year:

1984

File:

PDF, 1.17 MB

1984

15

Subsurface Damage Characterization of Hydrogen Ion Implanted Silicon Wafer with Uv/Millimeter-Wave Technique

Ogita, Yoh-Ichiro, Kobayashi, Ken-Ichi, Kurokawa, Masaki, Kondo, Hideyuki, Katoh, Takeo

Journal:

MRS Proceedings

Year:

2000

File:

PDF, 166 KB

2000

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